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ANISOTROPIC RELAXATION TIMES IN THE TRIVALENT
METALS ALUMINUM AND INDIUM
Willem van der Mark
Laboratorium fuer Festkoerperphysik
Eidgenoessische Technische Hochschule
8049 Zuerich, Switzerland.
1976
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CONTENTS
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I. INTRODUCTION. page 1
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1). Historical background. 1
2). Organization. 5
II. METALLURGICAL PROPERTIES OF ALUMINUM AND INDIUM SYSTEMS.
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1). Properties of aluminum and indium host. 7
a). Aluminum. 7
b). Indium. 11
2). Solutes in Al and In solvents. 15
a). Aluminum solutes. 18
b). Indium solutes. 22
III.ANISOTROPIC RELAXATION TIMES. 25
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1). Structural and free electron data. 25
2). Pseudopotentials. 30
a). Introduction. 30
b). Empty core potential. 32
c). Shaw potential. 34
d). Fermi energy for solute. 38
e). Results: Shaw potential parameters. 43
f). Calculation of Shaw potential. 45
3). Scattering. 47
a). Transition probabilities. 47
b). Lattice distortions. 50
c). Phase shifts (Results). 53
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IV. REAL FERMI SURFACES AND GALVANOMAGNETIC EFFECTS. 56
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1). Multiple wave scattering. 56
a). Introduction. 56
b). Amplitude factors. 57
2). Conduction in a magnetic field. 60
a). General expression. 60
b). Expansion in powers of H. 64
3). Definition of 3-band model of Fermi surface. 66
V. HALL EFFECT MEASUREMENTS IN INDIUM. 69
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1). Introduction. 69
2). Experimental setup. 70
a). Cryogenics. 70
b). Magnetic fields. 70
c). Measurements. 71
3). Alloys and samples. 72
4). Results. 73
a). Residual resistivity. 73
b). Magnetoresistance. 75
c). Hall effect. 76
5). Rigid band changes. 79
6). Discussion. 82
a). Resistivity. 82
b). Low field Hall coefficient R\o\. 88
c). Temperature dependence of R\o\. 93
VI. SUMMARY. 98
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References. 100